| Plasma processing has become pervasive in manufacturing semiconductors. The ever-decreasing size of the transistors puts radically increasing restrictions on the semiconductor processing equipment. The understanding of plasma processing has been largely empirical, and thus the equipment has most-often been designed without consideration/understanding of basic plasma physics and plasma-surface interactions. The talk will begin with an introduction to low-temperature plasma physics. Some examples of industry blunders will be described, and the simple plasma physics that solved the problem will be explained. |
